Rogge, M.C.; Fühner, C.; Keyser, U.F.; Haug, Rolf J.; Bichler, M.; Abstreiter, G.; Wegscheider, W.
(College Park, MD : American Institute of Physics, 2003)
A study was performed on combined electron-beam lithography and atomic force microscopy used for the fabrication of variable-coupling quantum dots. The conventional electron-beam lithography was combined with direct ...